镜面铝板的镜面效果来源于两个方面,一是基材本身要达到镜面,二是氧化膜要高度清纯透明.的氧化铝板镜面效果有目共睹，现在技术员与大家分析镜面效果的形成。
Mirror surface of the mirror surface results from two aspects, one is the substrate itself to reach the mirror, the two is the oxide film to be highly pure and transparent. The effect of the mirror surface of the aluminum oxide plate is obvious. Now the technician and everyone analysis the formation of the mirror effect.
铝合金表面做草酸氧化膜和铬酸氧化膜带有颜色,不是清澈透明的,自然不在考虑之列.对硫酸氧化膜而言,影响透明度的因素主要有:氧化膜纯度/氧化膜厚度/氧化膜孔隙率/封孔质量.氧化膜中如果裹挟有过多的硅/锰/铁/铜/铬等杂质离子(或原子),氧化膜的纯度就低,透明度就会下降。
The oxalic acid oxide film and chromic acid oxide film on the surface of the aluminum alloy are color, not clear and transparent, and naturally are not considered. For the sulfuric acid oxide film, the factors that affect the transparency are the purity of the oxide film / the thickness of the oxide film / the porosity of the oxide film / the quality of the sealing. If there are too many impurities such as silicon / manganese / iron / copper / chromium in the oxide film, the oxide film is bound to be too much. Ion (or atom), the purity of the oxide film is low, and the transparency will decrease.
铝合金表面做草酸氧化膜和铬酸氧化膜带有颜色,不是清澈透明的,自然不在考虑之列.对硫酸氧化膜而言,影响透明度的因素主要有:氧化膜纯度/氧化膜厚度/氧化膜孔隙率/封孔质量.氧化膜中如果裹挟有过多的硅/锰/铁/铜/铬等杂质离子(或原子),氧化膜的纯度就低,透明度就会下降.氧化膜虽然是透光的,但也会有一些光散射损失.氧化膜厚度增加时透明度也会下降.氧化膜的针孔是光散射的主要根源,孔隙率越高光散射就越多.

The oxalic acid oxide film and chromic acid oxide film on the surface of the aluminum alloy are color, not clear and transparent, and naturally are not considered. For the sulfuric acid oxide film, the factors that affect the transparency are the purity of the oxide film / the thickness of the oxide film / the porosity of the oxide film / the quality of the sealing. If there are too many impurities such as silicon / manganese / iron / copper / chromium in the oxide film, the oxide film is bound to be too much. The purity of the oxide film is low and the transparency will decrease. Although the oxide film is transparent, there will be some light scattering loss. The transparency of the oxide film will decrease when the thickness of the oxide film increases. The higher the porosity is, the more the light scattering is.
特别是针孔呈显着的喇叭形时,光散射会急剧增加,透明度就会迅速下降.封孔物质是勃姆石,常温封孔时还有氢氧化镍和氟铝酸盐,它们都是透明的,因此正常的封孔基本上不会降低氧化膜的透明度.但是如果发生过封孔,所形成的粉霜就全部成为光散射质点,就会使氧化膜的透明度大幅降低.所以,改善氧化膜的透明度应从提高氧化膜纯度/控制氧化膜厚度/降低氧化膜孔隙率/保证封孔适度这四个方面入手。
In particular, the light scattering will increase sharply and the transparency will decline rapidly when the pinhole is displayed. The sealing material is the boehmite, and at normal temperature, there are nickel hydroxide and fluoro aluminate, all of them are transparent, so the normal sealing will not reduce the transparency of the oxide film basically. As for all light scattering particles, the transparency of the oxide film will be greatly reduced. Therefore, the improvement of the transparency of the oxide film should start with the four aspects of improving the purity of the oxide film / controlling the thickness of the oxide film / reducing the porosity of the oxide film / ensuring the moderation of the sealing hole.
氧化膜中的杂质主要来源于铝件本身,次要来源是氧化槽液.因此,适当降低铝件中合金元素的含量,尽量降低铝件的杂质含量,甚至选用高纯铝都能提高氧化膜纯度.降低槽液中的杂离子,保持槽液新鲜也能提高氧化膜纯度.氧化膜厚度以控制在10-12um为宜,如果产品标准不要求氧化膜厚度>=10um,则将氧化膜厚度控制在6-8um.氧化膜的孔隙率主要取决于溶膜速度,溶膜越快则孔隙率越大.溶膜速度与硫酸浓度/槽液温度/电流密度成正变关系,因此,适当降低硫酸浓度/槽液稳度/电流密度过都会降低氧化膜的孔率。
The impurities in the oxide film are mainly from the aluminum itself and the secondary source is the oxidation slot. Therefore, it is necessary to reduce the content of the alloy elements in the aluminum parts, reduce the content of the impurities in the aluminum parts as much as possible, and even select the high purity aluminum to improve the purity of the oxide film. In order to control the 10-12um, if the product standard does not require the oxide film thickness of >=10um, the porosity of the oxide film is mainly controlled by the dissolution rate of the 6-8um. oxide film. The faster the dissolution of the film, the larger the porosity is, the relationship between the dissolution rate and the concentration of sulphuric acid / bath liquid temperature / current density is positive. Therefore, the sulphuric acid concentration / slots are appropriately reduced. Stability or current density will reduce the porosity of the oxide film.
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